Journées Nationales de la Lithographie par NanoImpression

JNIL 2025, 05 et 06 Juin 2025, Toulouse

Logo LTM
Logo LPCNO
Logo LAAS
Logo INL
Logo CEA
Logo CNRS
Logo Renatech
Logo C2N
Logo SOLNIL
Logo LHC

Thursday 05/06

Time Event
12:30 - 13:30 Welcoming the JNIL participants
13:30 - 14:00 WELCOME SPEECH
Mohamed KAANICHE, LAAS Director
and Jean-Louis LECLERCQ, Renatech Director
14:00 - 14:45 PLENARY SESSION
"30 Years of Nanoimprint: A Transformative Technology Revolutionizing Research, Nanomanufacturing, and Industry"
- Prof. Stephen Y. Chou
14:45 - 15:00 SCIENTIFIC TALK
15:00 - 15:15 SCIENTIFIC TALK
15:15 - 15:30 SCIENTIFIC TALK
15:30 - 15:45 INDUSTRIAL TALK
15:45 - 16:00 INDUSTRIAL TALK
16:00 - 16:45 COFFEE BREAK
16:45 - 17:30 INVITED TALK
"Grayscale nanopatterning for 2D Material strain engineering"
- Jürgen Brugger, EPFL
- Institute of microengineering
17:30 - 17:45 SCIENTIFIC TALK
17:45 - 18:00 SCIENTIFIC TALK
18:00 - 18:15 INDUSTRIAL TALK
18:30 - 19:00 POSTER SESSION & INDUSTRIAL EXHIBITION
19:00 - DINNER GALA - French gourmet restaurant in Toulouse

Friday 06/06

Time Event
8:30 - 9:05 INVITED TALK
Dr. Nikos Kehagias, Researcher, Scientific technical advisor @ Nanotypos
"Adaptable meta surfaces via alternative nano-manufacturing techniques"
9:15 - 9:30 Scientific talk
9:30 - 9:45 Scientific talk
9:45 - 10:00 Scientific talk
10:00 - 10:30 Coffee break
10:30 - 12:30 NIL workshop sessions (upon registration)
1) NanoNex equipment demo
2) Getting around NIL techniques and soft lithography with table top equipments
12:30 Closing of the congress - Award ceremony (poster session)
12:45 Lunch & discussions

Bruker
Eden Tech
Evident

GDR µfluidique
microlight3D
FERMaT

NanoX
Renatech
Scientec

SET
Silsef